| abstract |
In order to remove edge beads of photoresist and pigment dispersion resist that are unevenly applied to the edge of the substrate, there is provided a cleaning solution for EBR containing ether, ketone, amine, alkali metal hydroxide and deionized water and cleaning method using the same do.n n n By using the EBR cleaning solution according to the present invention, the edge bead can be effectively removed, thereby reducing the cost and contributing to the improvement of reliability, performance and yield of the semiconductor device or the liquid crystal display device manufactured in a subsequent process. |