http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040035345-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2707056d594790a62947ee030653e6f8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate | 2002-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_527f80c388a7cf7ad2954aa3cc25a840 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33804065f7583909f2d2d431ac7f5487 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_306f23412b0732f91d4b6b2f2e4e702a |
| publicationDate | 2004-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040035345-A |
| titleOfInvention | Photopolymerizable Resin Composition For Sandblast Resist and photosensitive film laminate comprising the same |
| abstract | The present invention relates to a photosensitive resin composition for sandblast resist, which is an alkali-soluble binder polymer, wherein R 1 , R 2 , R 3 , R 4 , R 5 or R 6 is H, , Cellulose derivatives represented by the formula (1); R 1 , R 2 , R 3 , R 4 , R 5 or R 6 are H, , Cellulose derivatives represented by the formula (1); R 1 , R 2 , R 3 , R 4 , R 5 or R 6 are H, (m is an integer of 3 to 10), Cellulose derivatives represented by the formula (1); And R 1 , R 2 , R 3 , R 4 , R 5 or R 6 are H, (l is an integer from 2 to 10), , When using a cellulose derivative selected from the cellulose derivatives represented by the formula (1), the dry film resist including the same having excellent reactivity, resolution, adhesion, and sandblasting resistance is used for the sandblast resist used in the manufacture of the PDP lower plate. As the adhesion between the sandblast resist and the partition material can be strengthened, and the adhesion between the partition material is remarkably improved, it is possible to obtain an excellent effect of improving adhesion to the white lip material as well as the black lip material.n n n n n n n n n n In the above formula, the total molecular weight of the entire molecule is 30,000 to 100,000. |
| priorityDate | 2002-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.