| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2002-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c3f09754b71619a7636c02bedfde90c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5d8a712e6c58fe6838f8c202c69809d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec72e12d4077c325ad02dc88ccb08bb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_553eaaf266ef24d8ed2e7db69d5d555a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd72344004c85e89a41191418564c5b |
| publicationDate |
2004-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040032259-A |
| titleOfInvention |
Pattern forming method of semiconductor device |
| abstract |
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a pattern of a semiconductor device. In particular, in the process of forming a photoresist pattern of a semiconductor device, an anti-reflection film is etched to form fine bends, thereby forming a gap between the photoresist and the antireflection film. The present invention relates to a method for forming a pattern of a semiconductor device, by increasing the contact area of the photoresist to prevent the photoresist pattern from collapsing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100976651-B1 |
| priorityDate |
2002-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |