| abstract |
The present invention is a chemically amplified resist sensitive to actinic radiation such as ultraviolet rays such as g-rays, i-rays, KrF excimer lasers, ArF excimer lasers or F 2 excimer lasers, far ultraviolet rays or electron beams represented by EUV, and the like. Provided is a radiation sensitive composition having excellent storage stability.n n n In addition, the acid dissociable group may be dissociated as (A) 1-position substituted imidazole, (B) radiation-sensitive acid generator, and (C) (A) alkali insoluble or alkali poorly soluble resin protected by an acid dissociable group. A positive radiation sensitive resin composition comprising a resin which becomes alkali-soluble at the time, or (b) an alkali-soluble resin and an alkali solubility control agent, and (D) alkali in addition to the above (A) and (B). The negative radiation sensitive resin composition containing the compound which can bridge | crosslink alkali-soluble resin in presence of soluble resin and (E) acid is provided. |