http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040030532-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2002-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040030532-A |
| titleOfInvention | Resist releasing composition |
| abstract | According to this invention, the composition for resist peeling containing a nitro group containing organic compound (A) and a resist peeling agent (B) is provided. By using such a composition, it is possible to efficiently remove resist residues generated at the time of wiring formation in a manufacturing process such as an electronic circuit for a semiconductor or a liquid crystal, and to suppress corrosion of a silicon substrate or to form a thin film transistor component. Corrosion of phosphorus a-Si and p-Si can be effectively prevented. |
| priorityDate | 2001-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 141.