http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040029969-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2002-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040029969-A |
| titleOfInvention | Positive photosensitive resin compositions and semiconductor device |
| abstract | The present invention relates to a positive photosensitive resin composition capable of providing a pattern having high resolution and high sensitivity and having high film retention. One of these compositions is 1,2-naphthoquinone-2-diazide-5-sulfonic acid ester or 1,2-naphthoquinone-2- of 100 parts by weight of polyamide and 1 to 50 parts by weight of a phenolic compound which is a photosensitive material. Diazide-4-sulfonic acid esters. Another composition is 100 parts by weight of polyamide, 1,2-naphthoquinone-2-diazide-5-sulfonic acid ester or 1,2-naphthoquinone-2-dia of 1 to 50 parts by weight of a phenolic compound which is a photosensitive material. Zide-4-sulfonic acid esters, and also contains 1 to 30 parts by weight of phenolic compounds. Moreover, the semiconductor device manufactured by either of said positive photosensitive resin composition is also provided. |
| priorityDate | 2001-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 70.