http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040026097-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4283a2f8ade5dc582d75300427a38e50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ecdfc9030125055f06a260938acdacab |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-1204 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-861 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
| filingDate | 2003-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00d86e8266bf641dca762740b9a48c59 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ca75f33cf5173491fbe5dac231ddbfb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd49b91fd617a4e6af0cb1a768708dec |
| publicationDate | 2004-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040026097-A |
| titleOfInvention | A method for preparing a functional film |
| abstract | The present invention provides a method for easily forming a pattern of a highly precise functional thin film even when the material for forming the functional thin film does not have radiation sensitivity, when etching of the functional thin film is difficult or when it is difficult to form the thin film by vapor deposition. And a substrate having a pattern of a functional thin film obtained according to the method.n n n In the method for forming a functional thin film having a desired pattern, the step (1) of forming the reverse pattern of the desired functional thin film pattern on the substrate by a radiation-sensitive resin composition, wherein the functional component is contained on the surface of the substrate having the reverse pattern. The step (2) of forming the functional thin film which coat | covers the said pattern and the whole surface of the said pattern and the board | substrate, and the board | substrate with a functional thin film were processed by the release agent, and the radiation-sensitive resin composition of a reverse pattern was made into the said liquid composition to apply | coat and dry the said liquid composition. A step (3) of removing together with the above functional thin film to obtain a pattern of the desired functional thin film is included. |
| priorityDate | 2002-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.