http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040014173-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23c43aa3fe55d690d955960d87a560cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a51be7116a241fb587bd009710d904e7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c5e7896cd81053eae8dc081ae85e2d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa777e1a25f93c8f18382bb87c9a15d |
| publicationDate | 2004-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040014173-A |
| titleOfInvention | Coating liquid composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern |
| abstract | A coating liquid composition for forming an antireflection film laminated on a positive photoresist layer corresponding to an ArF excimer laser, the coating liquid composition comprising: (a) a water-soluble film-forming component, (b) a perfluoroalkylcarboxylic acid having at least 4 carbon atoms and a perfluorine having at least 5 carbon atoms. At least one fluorine-based compound of the roalkylsulfonic acid, (c) (c-1) fluoroalkylsulfonic acid having 1 to 4 carbon atoms, and / or (c-2) at least one hydrogen atom substituted with a fluoroalkylsulfonyl group Disclosed are a coating liquid composition for forming an antireflection film, a photoresist laminate and a photoresist pattern forming method containing an acidic compound consisting of four hydrocarbons (at least one carbon atom of a hydrocarbon group may be substituted with a nitrogen atom). According to the present invention, there is provided a coating liquid composition for forming an upper antireflection film having an excellent effect of improving the shape of a pattern head in the formation of an ultrafine photoresist pattern using a photoresist corresponding to an ArF excimer laser. |
| priorityDate | 2002-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 197.