| abstract |
The present invention provides a method of making an embossed surface comprising a polymer having a first glass transition temperature (T g1 ) comprising embossing the surface at a temperature (T emb ); And raising the second glass transition temperature (T g1 ) of the embossed polymer surface to the second glass transition temperature (T g2 ) such that T g2 > T emb . In another embodiment, a method of improving the peelability of a polymer surface from an embossing device includes incorporating one or more fluorine atoms, silicon atoms, or siloxane fragments into the backbone of the polymer. The method is particularly suitable for the direct patterning of photoresists, the fabrication of interdigitated electrodes, and the fabrication of data storage media. |