| abstract |
A storage electrode wiring formed on the insulating substrate and including the storage electrode line and the storage electrode and not including two or more protruding branches without a connection path, the gate wiring formed on the insulating substrate, the gate wiring and the storage electrode wiring; A thin film transistor substrate including a gate insulating film, a semiconductor layer formed on the gate insulating film, a data wiring formed on the semiconductor layer, a protective film formed on the data wiring, and a pixel electrode formed on the protective film is prepared. In this way, water stains and horizontal streaks can be removed. |