http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040005484-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
filingDate 2002-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62fd01c20902429cabb6031ac168c508
publicationDate 2004-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20040005484-A
titleOfInvention Photoresist of t-BOC type containing electron withdrawing group, and method of photolithography using the same
abstract The present invention relates to a t-BOC type photoresist represented by the following formula having an electron withdrawing group at position a, and a photolithography method using the same.n n n n n n n n Wherein R represents F, Cl, Br, I, aldehyde, ketone, carboxylic acid, ester, amide, sulfonic acid, nitrile or nitro.
priorityDate 2002-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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