http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040004370-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L77-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 |
| filingDate | 2002-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040004370-A |
| titleOfInvention | Photosensitive resin composition, process of forming patterns with the same, and electronic components |
| abstract | Photosensitive of at least one of the polyamide resin (A) which has a repeating unit (U1) represented by general formula (I) shown below, and the polyamideimide resin (B) which has a repeating unit (U2) represented by general formula (II). It contains at least one photopolymerizable compound of resin, the photopolymerizable unsaturated monomer (D) containing the silane coupling agent (C) which has a photopolymerizable unsaturated bond, and the monomer (d1) which has 5 or more photopolymerizable unsaturated bonds in a molecule | numerator. A photosensitive resin composition, a pattern manufacturing method using the same, and an electronic component are disclosed.n n n [Formula I]n n n n n n n n (Wherein, X 1 represents a trivalent organic group having an aromatic ring, Y 1 represents a divalent organic group having an aromatic ring, and R 1 represents a monovalent organic group having a photosensitive group)n n n [Formula II]n n n n n n n n (Wherein, X 2 and Y 2 represent a trivalent organic group having an aromatic ring, and R 2 represents a monovalent organic group having a photosensitive group) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220065143-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180121871-A |
| priorityDate | 2001-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 262.