http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040001125-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9733eeacab58d455d62db819b5c3aafc |
| publicationDate | 2004-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040001125-A |
| titleOfInvention | Method for forming the phase shifting mask |
| abstract | BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to photomask fabrication. In particular, in the method of fabricating a phase inversion mask, a phase inversion mask and a chromium film are deposited on a quartz substrate, and a first patterning process is performed to form a chromium pattern. In the second patterning process for forming, by removing chromium etching liquid only in the areas where chromium remains, the chromium remaining on the phase inversion film can be removed to simplify the mask fabrication process, thereby reducing the process time and process cost. It is a technique to improve the mask production yield. |
| priorityDate | 2002-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.