http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030087631-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2217-49207 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
| filingDate | 2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030087631-A |
| titleOfInvention | Method for etching layers deposited on transparent substrates such as a glass substrate |
| abstract | The present invention is directed to a method of electrochemical etching of a layer (11) having electrical conductivity of a doped metal oxide type, on a glass type transparent substrate (10) provided with a mask to be removed after etching. Contacting at least the region 13 of the layer to be etched with the electrically conductive solution 20, immersing the electrode 30 in the solution 20 and placing the electrode facing at a distance d from the region 13; The electrical voltage U is applied between the layer 11 and the electrode 30 to be etched. The invention is characterized in that the electrode has an extended form such that the etching is performed on several regions of the layer over the width l of the substrate. |
| priorityDate | 2001-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.