http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030083583-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32733 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-00 |
| filingDate | 2003-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030083583-A |
| titleOfInvention | Plasma treatment system |
| abstract | The present invention relates to a plasma processing system for treating a workpiece with a downstream plasma. The processing chamber of the plasma processing system includes a chamber cover having a plasma cavity generally disposed between a powered electrode and a grounded electrode, a processing space separated from the plasma cavity by the grounded plate, and holding the workpiece. It includes a substrate support in the control space for. Direct plasma is generated in the plasma cavity. The grounded plate is adapted to an opening that removes electrons and ions from the plasma allowed from the plasma cavity to the processing space to provide a free radical downstream plasma. The opening may also eliminate a line of sight path for light between the plasma cavity and the processing space. In another feature, the space of the processing chamber can be adjusted by removing or inserting at least one removable sidewall from the chamber lid. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180134910-A |
| priorityDate | 2002-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.