| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-1416 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate |
2002-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95cc335633b4ad537d7cd2b11940eb13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1066630d739594cd11f135ec4201798c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a385a39ab34514fd7c9c0f2776f5c4ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0dc4610c032924ab3fc041d1ae2187e |
| publicationDate |
2003-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20030082875-A |
| titleOfInvention |
Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresist patterns |
| abstract |
A resist composition comprising a photoacid generator (PAG) and a photosensitive polymer is disclosed. The photosensitive polymer includes a comonomer having a substituent or a polar functional group decomposable by an acid, and a copolymer of an alkyl vinyl ether and maleic anhydride. The copolymer is represented by the following formula.n n n n n n n n Wherein, k is an integer of 3 ~ 8, X is a tertiary alcohol of the cyclic C 7 ~ C 20. |
| priorityDate |
2002-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |