| abstract |
It prevents scratches, peeling, dishing, and corrosion, and enables high speed copper or copper-based alloys, and especially CMP of copper or copper-based alloys on low dielectric constant insulating films that are easy to peel off. do. By using a plurality of anticorrosive agents, for example, BTA and imidazole, together in the abrasive liquid containing no abrasive grains, a protective film having excellent protective properties but easy to be removed by mechanical friction is formed. |