http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030065412-A

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filingDate 2003-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2003-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20030065412-A
titleOfInvention Film forming method, film forming apparatus, pattern forming method and manufacturing method of semiconductor device
abstract The liquid film which forms the liquid film by moving the said nozzle and the said board relatively, and staying the solution supplied on the said board | substrate, discharging the solution adjusted so that the fixed amount enlarged in the board | substrate with respect to the said board | substrate from the discharge port provided in the nozzle continuously In the forming method, the distance h between the discharge port of the nozzle and the substrate is 2 mm or more, and the surface tension γ (N / m) of the solution and the discharge speed q (m / of the solution continuously discharged from the discharge port). sec) and within a range of less than 5 × 10 −5 qγ (mm) provided for the constant 5 × 10 −5 (m · sec / N).
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170087524-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10325787-B2
priorityDate 2002-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.