http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030059970-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_972975964e19622bd9770d818250cc8a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 2002-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86653d6f16db863ac81c0b9eb841733c |
| publicationDate | 2003-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030059970-A |
| titleOfInvention | Organic bottom anti-reflective coating material for prevention of resist pattern collapse and patterning method using it |
| abstract | The present invention relates to a composition of a lower layer of photoresist, that is, an organic anti-reflective coating, which is used to increase the uniformity of a pattern in an ultra-fine pattern formation process of a semiconductor. In addition, by providing a new base to the thermal acid generator to provide an organic anti-reflective coating composition that can overcome the cross-sectional pattern and pattern collapse phenomenon of the pattern, the organic anti-reflective coating composition according to the present invention has a unique wave effect (standing wave effect) Not only can be significantly reduced, but the pattern collapse of the photosensitive agent in the upper part of the organic anti-reflective coating layer can be remarkably improved. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101105995-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004048458-A1 |
| priorityDate | 2002-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.