http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030059222-A

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filingDate 2001-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2003-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20030059222-A
titleOfInvention Method for the production of low defect density silicon
abstract The present invention relates to a method of growing a single crystal silicon ingot comprising axially symmetric regions substantially free of coherent intrinsic point defects. The method comprises the steps of: (i) forming a region within a portion of the diameter where vacancy becomes the dominant intrinsic point defect, and (ii) silicon self- from the heated surface to the region reducing the concentration of vacancy in the region. Heating the sides of the ingot to a temperature above the temperature of the region to cause a thermally induced internal influx of interstitial atoms, and (iii) the time between the formation of the region and a decrease in the concentration of baconcies within the region. Maintaining the temperature of the region above a temperature T A at which agglomeration of bacon point defects into coagulation defects occurs.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100788018-B1
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priorityDate 2000-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 36.