| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F218-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-1416
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2001-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_922154cae974fca480ce974151ae3808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4cf3c63d2c50d72370dec6b3d00d78e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95cc335633b4ad537d7cd2b11940eb13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a385a39ab34514fd7c9c0f2776f5c4ee |
| publicationDate |
2003-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20030057948-A |
| titleOfInvention |
Photosensitive polymer having fluorinated-alkyl norbornene carboxylate including hydroxy group and resist composition containing the same |
| abstract |
The photosensitive polymer according to the present invention comprises a fluorine-substituted alkyl norbornene carboxylic ester monomer having a hydroxy group. The photosensitive polymer according to the present invention is a copolymer in which a fluorine-substituted alkyl norbornene carboxylic acid ester monomer is a polymer polymerized with an α-trifluoromethylacrylic acid or an α-trifluoromethylacrylic acid ester monomer, or a group consisting of norbornene derivatives and styrene derivative monomers. It has a polymer form of terpolymer or more comprising at least one monomer selected from. The photosensitive polymer according to the present invention is easy to manufacture, and the resist composition composed of the photosensitive polymer is transparent to an exposure source having a short wavelength, has good wettability of the resist film and good adhesion to the underlying film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200041284-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7510747-B2 |
| priorityDate |
2001-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |