http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030052628-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-65
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-105
filingDate 2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_495b95e39a31bfc45c057da5c4afae44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54d39a2165e25525288035f5bf280cc3
publicationDate 2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20030052628-A
titleOfInvention Method of fabricating capacitor in ferroelectric semiconductor memory device
abstract The present invention relates to a method for manufacturing a capacitor of a ferroelectric memory device, and in particular, to form an additional upper electrode in a capacitor of a stack structure to facilitate the etching process for the isolation of the upper electrode. Forming a; Forming a ferroelectric on the entire surface of the substrate including the lower electrode; Forming an upper electrode having a uniform thickness on the ferroelectric; Forming an additional upper electrode on the upper electrode; And etching the additional upper electrode in front to isolate the upper electrode.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8039829-B2
priorityDate 2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25199601
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452010600

Total number of triples: 18.