Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2002-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 |
publicationDate |
2003-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20030051200-A |
titleOfInvention |
Positive photosensitive composition |
abstract |
(A) an acid is generated by irradiation with actinic light or radiation, has an acid generator having a structure represented by the general formula (I) and (B) a monocyclic or polycyclic alicyclic hydrocarbon structure, The positive photosensitive composition containing resin which decomposes | disassembles by effect and the solubility in alkaline developing solution is increased. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101253105-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100889197-B1 |
priorityDate |
2001-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |