http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030043724-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd83260a96356882b5f50dd097411a72 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76825 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
filingDate | 2002-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cab9ce95ea3677cefb7cd5ea0e285115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_400c2f41c9041c626922c328719b07f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16cf5f28499c4a02c1d13bf508845bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5030678ef94975beb886d730b4bedec |
publicationDate | 2003-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20030043724-A |
titleOfInvention | Method of manufacturing semiconductor device |
abstract | Forming a first interlayer insulating film 6 and a second interlayer insulating film 4 made of a low dielectric constant film on the substrate; Forming a via hole (9) using a first resist pattern (1a) formed on said second interlayer insulating film; Performing an organic peeling treatment using an organic peeling liquid containing an amine component; And forming a second resist pattern 1b on the second interlayer insulating film, after the wet treatment, a second matte coating 2b to be positioned below the second resist pattern. ), At least one of annealing treatment, plasma treatment, UV treatment, and organic solvent treatment is performed to remove the amine component that inhibits the catalysis of acid generated in the resist during exposure, thereby forming the second resist pattern. The resolution of (1b) is prevented from falling. |
priorityDate | 2001-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.