http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030039661-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D265-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D241-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-00 |
| filingDate | 2001-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d9894aea7f6ffe388a9eeb805587c6a |
| publicationDate | 2003-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030039661-A |
| titleOfInvention | Precursor compounds for metal oxide film deposition and methods of film deposition using the same |
| abstract | The present invention relates to capacitors in electronic devices such as semiconductors, precursor compounds useful for depositing metal oxide films applied to substrates such as silicon, and methods of depositing such films. The precursor compound has the formula (1)n n n [Formula 1]n n n n n n n n Wheren n n M is a metal element selected from group 2A, 3A, 4A, 5A, 3B, 4B, 5B and 8B of the periodic table;n n n x and y are integers from 1 to 4, provided that the sum of x and y is an integer from 2 to 5;n n n R is hydrogen, fluoro, an alkyl group having 1 to 4 carbon atoms, a perfluoroalkyl group or a perfluoroaryl group;n n n R 1 and R 2 are independently an alkyl group having 1 to 8 carbon atoms, a perfluoroalkyl group or an alkoxyalkyl group;n n n A is a perfluoroalkylalkoxy or alkoxyalkylalkoxy of formula (2):n n n [Formula 2]n n n n n n n n From here,n n n R 3 is hydrogen, fluoro, or alkyl or perfluoroalkyl having 1 to 4 carbon atoms;n n n R 4 and R 5 are the same or different and are hydrogen, fluoro, or alkyl or alkoxy of 1 to 4 carbon atoms;n n n R 6 is alkyl or perfluoroalkoxy having 1 to 4 carbon atoms, or an amide group;n n n l and m are integers from 0 to 4;n n n L is a Lewis base;n n n n is an integer of 0 or more. |
| priorityDate | 2001-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 98.