http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030035951-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 |
| filingDate | 2002-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8382f19a5bb23f13b53ac198ffadc45b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56001f6a1048383fd633d33d2ecd3cc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c5d56c6c033d9fd7b104c7056105aba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c7740cff558a2d38ef00192c8f05a98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55376e1837da0b73561c2a0779c62c21 |
| publicationDate | 2003-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030035951-A |
| titleOfInvention | Window Member for Chemical Mechanical Polishing and Polishing Pad |
| abstract | An object of the present invention is excellent in antifouling property and transparency, excellent in scratch resistance, and in the polishing of a semiconductor wafer using an optical end point detection device, the end point detection of the surface of the semiconductor wafer can be easily performed by transmitting light for end point detection. The present invention provides a chemical mechanical polishing window member and a polishing pad. The chemical mechanical polishing window member 12 of the present invention includes a base portion (a polyurethane resin) 12a, which is partially or entirely transparent, and an antifouling resin layer 12b formed on at least one side of the base portion. It is preferable that the said antifouling resin layer is a fluoropolymer which has a polysiloxane segment in a main chain. The polishing pad 1 is fitted into a through hole of a substrate for polishing pad 11 (such as a polyurethane resin or a disk or belt) having a through hole through which the window member 12 passes back and forth, or It may be adhered to the substrate for the polishing pad to cover the bottom surface of the through hole. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170088444-A |
| priorityDate | 2001-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 225.