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filingDate 2002-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23cfb055bf88286becaa503a8173bab7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ec4bfef851aa40e4ba98b6811748d59
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publicationDate 2003-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20030013330-A
titleOfInvention Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat
abstract The organosiloxane-based high molecular compound of the present invention has a repeating unit represented by the following formula (1) and has a weight average molecular weight of 1,000 to 500,000, thereby producing a photocurable resin composition which can be exposed to a wide wavelength of light. Can:n n n n n n n n [R 1 ~R 4 is a monovalent hydrocarbon group, n is an integer of 1-2000, X has the formulan n n n n n n n (Me is a methyl group), and R 5 is the following formulan n n n n n n n R 'is a hydrogen atom or a methyl group and R "is a divalent hydrocarbon group, which may be the same or different acrylic functional organic groups.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210120776-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100949053-B1
priorityDate 2001-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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