http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030010893-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2001-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61fcdf2222f9b5898e886bde1d6962da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8502ae6b6a1fe006ea59d1aae8784c98 |
| publicationDate | 2003-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030010893-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | The present invention relates to a photosensitive resin composition for photoresist, and more particularly, (A) i) unsaturated carboxylic acid, unsaturated carboxylic anhydride, or a mixture thereof; Ii) epoxy group-containing unsaturated compounds; And iii) an acrylic copolymer obtained by copolymerizing an olefinically unsaturated compound; (B) 1,2-quinonediazide compounds; And (C) relates to a photoresist resin composition comprising an acrylate compound represented by the following formula (1):n n n [Formula 1]n n n n n n n n (In Formula 1, R is a hydrogen atom, or a C 1 to C 5 alkyl group, an alkoxy group, or an alkanoyl group; and 1 <a <6, a + b = 6)n n n The photosensitive resin composition according to the present invention is excellent in sensitivity, insulation, flatness, chemical resistance, and the like. In particular, it is easy to form a pattern as an interlayer insulating film, and has excellent transmittance even in a thick film, and thus is effective for use as an interlayer insulating film in an LCD manufacturing process. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100903356-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140087814-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101326595-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101030310-B1 |
| priorityDate | 2001-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 308.