http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030000076-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2001-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91e2b4f9c735230317049b6e80905508 |
| publicationDate | 2003-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030000076-A |
| titleOfInvention | A wafer ipa vapor dryer |
| abstract | BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor wafer drying apparatus for drying a wafer using IPA (Isopropyl alcohol) vapor in a semiconductor device manufacturing process. In the wafer drying apparatus of the present invention, a wafer is granulated inside through an opening. Iii) a treatment tank to be covered, a cover for covering the opening of the upper part of the treatment tank, a heating part for heating and vaporizing IPA and IPA contained in the lower part of the treatment tank to form an IPA vapor region in the treatment tank, and condensing the IPA steam in a predetermined region It consists of a vapor cooling section for maintaining the vapor zone of the and installed on the cover. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100708011-B1 |
| priorityDate | 2001-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.