http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020094362-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-1089 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 2001-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dbbf225e7b6dc26bdb719cb3e996635 |
| publicationDate | 2002-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20020094362-A |
| titleOfInvention | method for fabricating the wire of semiconductor device |
| abstract | To provide a method of forming a semiconductor device wiring suitable for improving the reliability of copper wiring by facilitating crystal growth of (111) crystals of copper wiring and improving the electrophoretic characteristics of the copper wiring. A method of forming a wiring of an element includes: forming a trench by patterning an interlayer insulating film on a substrate; forming a barrier metal film on the trench and the interlayer insulating film; forming a seed copper film on the barrier metal film; and the seed copper Forming a PVD metal film on the film by physical vapor deposition; depositing an electroplating metal film on the PVD metal film to fill the trench; exposing the interlayer insulating film to the inside of the trench It characterized in that it comprises a step of forming a metal wiring to remain. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100642908-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100815950-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100711928-B1 |
| priorityDate | 2001-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.