abstract |
The thermocouple for a continuous polymerization apparatus using the plasma of the present invention is a screen 33 formed so as to surround the upper surface to expose the output line 31 and the one end side of the output line 31 is joined so that the end of the temperature measuring point 32 ), An insulator 34 provided to surround the output line 31 exposed at the rear end of the screen 33, and an output protruding outward of the insulator 34 so as to extend to the output line 31. The temperature measurement part 32 of the output terminal 35 which is comprised by the terminal 35 and the radiation energy radiated | emitted from the inner surface of the electrode 25 and the chamber 21 at the time of vapor deposition operation is interrupted by the screen 33. Since the temperature around the material 22 is accurately measured, even if a continuous deposition operation for a long time is always made an accurate temperature measurement. |