| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C229-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C229-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C219-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C229-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C229-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C219-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-12 |
| filingDate |
2002-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be320ab77e8e1113b2306ca0a89a14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80ef552c51996da668b98c65da511d09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 |
| publicationDate |
2002-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20020082150-A |
| titleOfInvention |
Novel Tertiary Amine Compounds Having an Ester Structure and Processes for Preparing Same |
| abstract |
The present invention provides a novel ester group-containing tertiary amine compound which is useful in chemically amplified photolithography to provide a photoresist having excellent resolution and focus margin.n n n The present invention provides an ester group-containing tertiary amine compound represented by the following general formula (1), and also adds a primary or secondary amine compound represented by the following general formula (5) to the acrylic acid ester compound represented by the following general formula (6) After reacting the production method to react, the monoethanolamine represented by following formula (7) or diethanolamine by Michael addition reaction to the acrylic acid ester compound represented by Formula (6), to obtain the ester group containing amine compound represented by following Formula (8), R 1 group to, a method of introducing the ester group-containing tertiary amine represented by the formula (9) with R 2 OH to provide a manufacturing method of an ester exchange reaction. |
| priorityDate |
2001-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |