http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020080737-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2001-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71d2220846c6b725caa888a7919db8e4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47a831d02a718868788d8a5a5eb10855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72ee457bfb2df6cfe8219934909500f5 |
| publicationDate | 2002-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20020080737-A |
| titleOfInvention | Polymer for photoresist, producing method thereof and photoresist composition thereby |
| abstract | The present invention relates to a photoresist polymer, a method for preparing the same, and a photoresist composition using the same. More particularly, the present invention provides a photoresist polymer of Formula 1 and a photoresist composition comprising the same. It is possible to provide a chemically amplified photoresist composition having improved physical properties such as formation of micropatterns and transmittance under a light source.n n n [Formula 1]n n n n n n n n Wherein m is 1 to 4; R 1 is hydrogen or a methyl group; R 2 is an acid deprotectable functional group which is a linear, branched or cyclic alkyl group, haloalkyl group, alkoxycarbonyl group, phenyl group or naphthyl group having 1 to 12 carbon atoms; R 3 is a halogen or trifluoromethyl group; R 4 represents a linear, branched or cyclic alkylester, hydroxy or nitrile group having 1 to 12 carbon atoms; In x, y and z x and y are not 0, at least one of y and z is not 0, 0.4≤x / (x + y + z) ≤0.9, 0≤y / (x + y + z) It is a value which satisfies ≤ 0.5, 0 ≤ z / (x + y + z) ≤ 0.5. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10234760-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10551738-B2 |
| priorityDate | 2001-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 232.