| abstract |
Titanium dioxide and cobalt magnetic films useful as photocatalysts having high catalytic ability, semiconductor materials having optical, electrical and magnetic functions, and transparent magnets, are represented by the formula Ti 1-x Co x O 2 (where 0 <x ≤ 0.3). Co is substituted at the Ti lattice position, and a titanium dioxide cobalt magnetic film epitaxially grown on a single crystal substrate is formed. This crystal structure is an anatase structure or rutile structure, and the bandgap energy changes in the range of 3.13 eV to 3.33 eV corresponding to the Co concentration substituted at the Ti lattice position, maintains magnetization even at a temperature higher than room temperature and is transparent to visible light.n n n When producing a titanium dioxide cobalt magnetic film, a predetermined laser beam is irradiated to a target made of TiO 2 and Co mixed in a predetermined mixing ratio in a vacuum chamber of a predetermined oxygen pressure atmosphere under predetermined conditions, and TiO 2 and Co It is produced by forming a film on a single crystal substrate which is evaporated and heated to a predetermined substrate temperature. |