| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-06 |
| filingDate |
2002-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_831e31a34acb5ee71ce79eeec7e55f97
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bffa4a732672dd927e60534c6ed14fee |
| publicationDate |
2002-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20020062173-A |
| titleOfInvention |
Polymers, resist materials, and pattern formation method |
| abstract |
The present invention provides a polymer compound having excellent reactivity, rigidity and substrate adhesion, and having a low swelling during development, a resist material having this polymer compound as a base resin and having a resolution and etching resistance far exceeding conventional products, and this resist It is an object to provide a pattern formation method using a material.n n n It is to provide a novel polymer compound having a weight average molecular weight of 1,000 to 500,000 containing a repeating unit represented by the following Formula 1a or 1b, a resist material using the polymer compound as a base resin, and a pattern forming method using the resist material.n n n <Formula 1a>n n n n n n n n <Formula 1b> |
| priorityDate |
2001-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |