http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020054528-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a62ca3da6340e62ea3cac80f2e0989a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc03e6c9ea290c78cd1c980d1bb91fe6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7baded9dc22330e4443e44691bd85f7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35a262981d2da65e75a3cbfea88036c5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9c40721ff8e0326402ec6c54701d73b |
| publicationDate | 2002-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20020054528-A |
| titleOfInvention | Photoresist composition |
| abstract | The present invention relates to a photoresist composition, and more particularly, (1) intermolecular hydroxy styrene / t- butyl acrylate copolymer or hydroxy styrene / t- butyl methacrylate copolymer intermolecular 100 parts by weight of a polymer compound having a molecular weight of 7000 to 100000 having a structure represented by the following formula (1) obtained by crosslinking by introducing bisphenol-A diethanoldivinylether or 1,4-cyclohexanedimethanoldivinylether as a crosslinking agent, ( 2) relates to a photoresist composition comprising 0.1 to 20 parts by weight of a photosensitive agent having the structure of Formula 5, (3) 0.01 to 10 parts by weight of organic base, and (4) 500 to 1000 parts by weight of organic solvent, according to the present invention. It is possible to provide a photoresist composition which maintains excellent residual film ratio even when cured at low temperature without degrading lithography properties.n n n [Formula 1]n n n n n n n n (Wherein R 1 is a hydrogen atom or a methyl group, R 2 is a t-butyl group or a methyl group, R 3 is a methyl group, X is or M and n are integers satisfying 0.05 ≦ n / m ≦ 0.5, respectively)n n n [Formula 5]n n n n n n n n (Wherein Q − is nonaflate or 10-camphorsulfonate and Me is a methyl group) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100706010-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030057112-A |
| priorityDate | 2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.