| abstract |
The present invention relates to a photoresist monomer and a polymer thereof capable of using a 2.38 wt% TMAH aqueous solution as a developer, and a photoresist monomer represented by the following Chemical Formula 1 and a photoresist polymer represented by the following Chemical Formula 2 are provided.n n n [Formula 1]n n n n n n n n [Formula 2]n n n n n n n n Wherein R, R ', x, y and z are as defined in the specification. |