http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020049448-A

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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_471c937069f03560e3b86efe0e7965aa
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publicationDate 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20020049448-A
titleOfInvention Chemical rinse composition
abstract BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical rinse composition for resist stripper cleaning, wherein the main purpose is to clean the remaining stripper liquid after the final removal of resist in the TFT LCD device and semiconductor device process. The chemical rinse composition for resist stripper cleaning of the present invention can effectively clean the stripper from the substrate by replacing conventional chemical rinse compositions such as methanol, ethanol, isopropyl alcohol, acetone, dimethyl sulfoxide and the like having problems with flammability.n n n In order to achieve the above technical problem, the present invention is a chemical rinse composition for resist stripper cleaning, a) inorganic alkali or organic alkali 0.05 to 3% by weight; b) 0.05 to 3 weight percent of one or more triazole-based preservatives; c) 0.1 to 30% by weight of an organic solvent; And d) 60 to 99% by weight of water.
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priorityDate 2000-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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