| abstract |
A photosensitive polymer comprising a copolymer of an acrylate or methacrylate monomer comprising a group represented by the following formula, and at least one comonomer selected from the group consisting of maleic anhydride monomers and cyclic vinyl ether monomers; Disclosed is a resist composition.n n n n n n n n Wherein R, R 1, R 2 and R 3 are each independently a hydrogen atom, C 1 ~ C 4 alkyl group, an alkoxy group, a phenyl group, a benzyl group, a phenoxy group of C 1 ~ C 4, or -M (R ') 3 , wherein M is Si, Ge, Sn or OSi, R 'is an alkoxy group, a phenyl group or a phenoxy group of C 1 ~ C 4 alkyl, C 1 ~ C 4 of. |