| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-64 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-72 |
| filingDate |
2000-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2002-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20020042724-A |
| titleOfInvention |
Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions |
| abstract |
CVD, such as barium strontium titanate, using a metal source reagent liquid solution comprising at least one metal coordination complex having a metal to which at least one ligand of the stable complex is coordinatively bound and a solvent for the metal coordination complex A method and apparatus for reducing effluent from a multi-component metal oxide deposited by an organometallic chemical vapor deposition (MOCVD) process for forming a (BST) thin film on a substrate. The effluent is adsorbed to remove precursor species and by-products of the MOCVD process for that effluent. An endpoint detector 62, such as a quartz trace balance detector, can be used to detect the initial breakthrough condition in the adsorption processing unit. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190083008-A |
| priorityDate |
1999-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |