| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate |
2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c0779298a9046dde3d7bfe24190040e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27b00832a065812413aa811607375801
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6aa94b99d191af190c229ac831f4bab4 |
| publicationDate |
2002-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20020029590-A |
| titleOfInvention |
Reflection type photomask |
| abstract |
Provided is a reflective photomask that can prevent damage to the surface of the reflective layer in the manufacturing process without complicating the manufacturing process. The reflective photomask of the present invention has a substrate made of silicon, glass, or the like, a reflective layer made of molybdenum and silicon formed on the substrate, and a buffer layer made of ruthenium formed on the reflective layer, and having a predetermined pattern shape. An absorber pattern made of a material such as tantalum nitride capable of absorbing soft X-rays formed on the buffer layer is provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100879139-B1 |
| priorityDate |
2000-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |