Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2001-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
publicationDate |
2002-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20020024546-A |
titleOfInvention |
Positive photoresist composition |
abstract |
(A) Resin which contains specific repeating structures, such as a norbornene structure, and whose dissolution rate with respect to alkaline developing solution increases by the action of an acid; And (B) a compound which generates an acid by irradiation of any one of actinic light and radiation. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030087190-A |
priorityDate |
2000-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |