| abstract |
In the substrate cleaning apparatus of the present invention, one end of the polishing sheet 9 disposed to be in contact with the surface of the liquid crystal panel 20 is wound while the other for winding the sheet roll 8 and the polishing sheet 9 from the other end. And a sheet roll 8 of the same. The apparatus further includes a rotating unit provided with a motor 1, a belt 4, and a rotating shaft 5 for rotating the polishing sheet 9 and the pair of sheet rolls 8 with respect to the liquid crystal panel 20. . Therefore, it is possible to shorten the working time at the time of removing the foreign matter, improve the work efficiency, stably remove the foreign matter, and do not increase the working time even when the substrate is enlarged. Does not provide a substrate cleaning device. |