| abstract |
The present invention provides a positive electron beam or X-ray resist composition which has high sensitivity, high resolution, can provide excellent rectangular profile patterns, and is excellent in PCD, PED stability, and applicability.n n n The present invention also provides a positive electron beam or X-ray comprising (a1) a compound which generates an acid by irradiation with an electron beam or X-ray, and (b) a nitrogen-containing compound having one or more specific substructures in the molecule. It consists of a resist composition. |