| abstract |
Since the present invention has excellent storage stability, it is easy to use, can be developed in a weak alkaline aqueous solution having a pH of about 10, has a high resolution, and has excellent film transparency after curing, and is excellent in heat resistance, solvent resistance, and insulation. This excellent positive photosensitive thermosetting resin composition is provided.n n n Moreover, this invention is alkali-soluble obtained by copolymerization containing 5 mol%-80 mol% of the polymerizable monomer of the following general formula (I) and monomer containing 5 mol%-80 mol% of carboxylic acid group as an essential component. It consists of a positive photosensitive thermosetting resin composition containing 10-120 weight part of 1, 2- quinonediazide compounds with respect to resin and 100 weight part of said alkali-soluble resins.n n n n n n n n (Wherein R 1 represents a hydrogen atom or a methyl group. X is a halogen atom, a hydroxy group, C 1-12, and may have a substituent, an alkoxy group, an aryloxy group, an alkylcarbonyloxy group, or an aryl). Carbonyloxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, alkylsulfonyloxy group, arylsulfonyloxy group) |