| abstract |
Disclosure of Invention The present invention is to solve the problems of the performance improvement technique inherent in the ultrafine photo production process using far ultraviolet light, in particular, ArF excimer laser light, and to provide a positive photosensitive composition having excellent sensitivity, resolution, and exposure margin.n n n The present invention consists of a positive photosensitive composition containing a compound which generates an acid by irradiation of actinic light or radiation, a resin having a specific alicyclic hydrocarbon structure, which is decomposed by the action of an acid to increase solubility in an alkaline developer. |