| abstract |
A resist composition comprising a photosensitive polymer having lactone in its backbone is disclosed. The photosensitive polymer constituting the resist composition according to the present invention includes at least one selected from monomer units represented by the following structures.n n n n n n n n In the formula, R 1 and R 2 are each a hydrogen atom, an alkyl group, a hydroxyalkyl group, an alkyloxy group, a carbonyl group or an ester group, and v, w, x and y are each an integer of 1-6. |