| abstract |
The present invention provides an organic antireflective polymer having a basic structure of Formula 1, a method for synthesizing the same, an antireflective composition containing the organic antireflective polymer, and a method for producing an antireflective film using the same. When the polymer according to the present invention is used as an antireflection film in an ultrafine pattern forming process, 64M and 256M are eliminated by eliminating CD fluctuations resulting from standing waves, reflections and underlying films due to variations in optical properties and resist thickness of the underlying film layer on the wafer. It is possible to form stable ultra fine patterns of 1G, 4G, and 16G DRAM, which not only increases the yield of the product but also has the advantage of freely controlling the k value of the organic anti-reflective coating. To prevent undercutting.n n n (Formula 1) |