http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010098918-A

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filingDate 2001-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2001-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20010098918-A
titleOfInvention Method of manufacturing thin film transistor panel having protective film of channel region
abstract The present invention relates to a method of manufacturing a thin film transistor panel applied to an active matrix liquid crystal display device and the like,n n n Since the protective film 33 for protecting the channel region of the thin film transistor 8 is formed by dry etching, no pinhole is formed in the gate insulating film 31 even when the semiconductor film 32 is bonded, and thus the gate electrode ( It is characterized in that the insulation breakdown voltage of the gate insulating film 31 can be prevented from being lowered even when the scan signal line 9 or the like including G) is formed only by the Al-based metal film having no anodic oxide film on the surface.
priorityDate 2000-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.