| abstract |
The present invention provides a polymer mixture of a polymer compound having a repeating unit represented by the following Chemical Formula 1 and having a weight average molecular weight of 1,000 to 500,000, and a polymer compound having a repeating unit represented by the following Chemical Formula 2 and having a weight average molecular weight of 1,000 to 500,000. It relates to a chemically amplified resist material containing.n n n The chemically amplified resist material of the present invention comprises a conventional resist material by blending a polyhydroxy styrene derivative, a copolymer of hydroxy styrene and a (meth) acrylic acid ester, in particular a three-component copolymer, into a resist material using a base resin. It is possible to provide a chemically amplified positive resist material having superior dry etching resistance, high sensitivity and high resolution, process adaptability, and improved reduction in pattern film thickness after development with aqueous alkali solution. |